Top-down patterning of Zeolitic Imidazolate Framework composite thin films by deep X-ray lithography
Articolo
Data di Pubblicazione:
2012
Citazione:
Top-down patterning of Zeolitic Imidazolate Framework composite thin films by deep X-ray lithography / Dimitrakakis, Constantinos; Marmiroli, Benedetta; Amenitsch, Heinz; Malfatti, Luca; Innocenzi, Plinio; Grenci, Gianluca; Vaccari, Lisa; Hill, Anita J; Ladewig, Bradley P; Hill, Matthew R; Falcaro, Paolo. - In: CHEMICAL COMMUNICATIONS. - ISSN 1359-7345. - 48:60(2012), pp. 7483-7485. [10.1039/C2CC33292B]
Abstract:
"\"For the first time a top-down process was used to control the. spatial location of Metal–Organic Frameworks on a surface.. Deep X-ray lithography was utilised to micropattern a Zeolitic. Imidazolate Framework layer on a sol–gel surface, with exposure. hardening the sol–gel by inducing crosslinking while leaving the. frameworks intact.\""
Tipologia CRIS:
1.1 Articolo in rivista
Keywords:
MOF; Deep X-ray lithography
Elenco autori:
Dimitrakakis, Constantinos; Marmiroli, Benedetta; Amenitsch, Heinz; Malfatti, Luca; Innocenzi, Plinio; Grenci, Gianluca; Vaccari, Lisa; Hill, Anita J; Ladewig, Bradley P; Hill, Matthew R; Falcaro, Paolo
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